BB.Suit 0.2: Wearable Clean Air
Welcome in the BB.Suit 0.2. Thanks to another great collaboration between ByBorre, Martijn ten Bhomer from the Eindhoven University of Technology, Eva de Laat, Daan Spangenberg Graphics, StudioFriso and WANT we continued the development of the BB.Suit platform and present you the “BB.Suit: Wearable Clean Air”. This exhibition showcases the opportunities of future clothing to contribute to the wellbeing of people living in polluted urban environments. It not only presents the problems around the complicated topic of air pollution, but also introduces high-tech materials, new wearable technologies and innovative production processes.
Cold Plasma Technology
The BB.Suit uses a patented technology called Cold Plasma (developed by Squair). This technology can split oxygen and water molecules into free radicals. These radicals react easily with toxic gases, bacteria, viruses and dust in order to clean the air. Since our clothing is constantly in contact with the air surrounding us it creates an opportunity to clean the polluted air. The integrated air quality sensor generates location-based data. When combining this data from all the wearers, a precise analysis of the air quality can be made, enabling people to react more effective to the pollution.
Location BB.Suit 0.2 + Air Quality based on the location
The air quality sensor integrated in the fabric of the “BB.Suit 0.2: Wearable Clean Air” measures the concentration of Carbon Monoxide, Methane and LPG in the surrounding air. The graph shows the output of the sensor in the suit which is currently placed in the exhibition in Beijing, the value can change between 0 and 1000 (where 1000 indicates a high concentration of pollutants).
The production process of the BB.Suit is based on techniques such as seamless knitting. The combination of the integrated wearable technology and advanced production techniques empowers producers and consumers to contribute to a cleaner fashion industry, with less side-waste and a more conscious and emotional bond between the wearer and their clothing.
And many thanks for Angeliki Sioliou, Rachel van Berlo, Orfeas Lycras, Camila Mosso Buron, Tim Scheffer and Anqi Li from the Eindhoven University of Technology.